Low-cost interference lithography

Low-cost interference lithography

The authors report demonstration of a low-cost 1000 USD interference lithography system based on a Lloyd’s mirror interferometer that is capable of 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substrate, and double-sided carbon scanning electron microscopy SEM tape. The laser and the machinist’s block ...

Development of a simple, compact, low-cost interference lithography system

Interference lithography IL has proven itself to be an enabling technology for nanofabrication. Within IL, issues of spatial phase distortion, fringe stability, and substrate development have been explored and addressed. However, IL tools are still unnecessarily expensive, large, and complex. To address these issues, the authors previously built a simple IL tool that used a blue laser diode to ...

Interference Lithography

Interference lithography (IL) is the preferred method for fabricating periodic and quasi-periodic patterns that must be spatially coherent over large areas. IL is a conceptually simple process where two coherent beams interfere to produce a standing wave, which can be recorded in a photoresist. The spatial-period of the grating can be as fine as half the wavelength of the interfering light, all...

Low-cost Polymer Fresnel Microlens Array Fabricated by Maskless Lithography

This work presents the fabrication of 8X8 PDMS Fresnel microlens array (MLA) by maskless lithographic system. The FWHM intensity values of each spot present a deviation of 8%. Such a MLA can be applied as Shack-Hartmann wavefront sensor and to enhance the efficiency of detector arrays. OCIS codes: (080.2208) Fabrication, tolerancing; (080.4298) Nonimaging optics

Interference Lithography for Patterned Media